Coating apparatus
Gas or vapor deposition
Multizone chamber
Inventor
active
Method for forming functional deposited films by means of microw
Method for forming functional deposited films by means of microw
Microwave plasma CVD apparatus having an improved microwave tran
Microwave plasma CVD apparatus having substrate shielding member
Process for forming a deposited film on each of a plurality of s
No associations
LandOfFree
Shigehira Iida does not yet have a rating. At this time, there are no reviews or comments for this inventor.
If you have personal experience with Shigehira Iida, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Shigehira Iida will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-P-660686