Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent
1990-07-11
1991-10-29
Pianalto, Bernard
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
427 451, B05D 306
Patent
active
050615114
ABSTRACT:
An improved method for forming a functional deposited film by introducing a raw material gas into a substantially enclosed reaction chamber containing a substrate onto which the functional deposited film is to be deposited and coupling microwave energy from a source of microwave energy thereinto to thereby form a glow discharge plasma causing decomposition of the raw material gas whereby forming the functional deposited film on the substrate, the improvement comprising supplying microwave of a power equivalent of 1.1 times or more over that of microwave with which the deposition rate for the decomposed products from the raw material gas being deposited onto the substrate to be saturated to the raw material gas in the reaction chamber and regulating the inner pressure of the reaction chamber to a vacuum of 10 m Torr or less.
According to the method of this invention, there can be formed a desired functional deposited film having a wealth of many practically applicable characteristics and having an improved response speed against photocurrent at an improved deposition rate with a raw material gas utilization efficiency of hundred percent or nearly hundred percent. And the method of this invention makes it possible to mass-produce various functional elements comprising such deposited film usable in electrophotographic photosensitive member, photosensor, thin-film transistor, solar cell, etc. on an industrial scale thereby enabling low cost production.
REFERENCES:
patent: 4517223 (1985-05-01), Ovshinsky et al.
patent: 4715927 (1987-12-01), Johncock et al.
Arai Takayoshi
Hashizume Junichiro
Iida Shigehira
Saitoh Keishi
Takei Tetsuya
Canon Kabushiki Kaisha
Pianalto Bernard
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