Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent
1988-03-10
1990-01-30
Silverman, Stanley
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
427 451, 118723, B05D 306
Patent
active
048972843
ABSTRACT:
An improvement in the known MW-PCVD process for forming a deposited film on each of a plurality of cylindrical substrates being so arranged as to surround the discharging space in a substantially enclosed reaction space of a deposition chamber by the glow discharge of raw material gas to generate plasmas containing reactive gaseous materials causing the formation of said deposited film in the discharging space while rotating said plurality of substrates, which comprises providing a gas feed pipe provided with a plurality of gas liberation holes opening into the discharging space in every space between every two of the substrates so as to form an encircled discharging space and an open non-discharging space by said plurality of cylindrical substrates and a plurality of gas feed pipes and regulating the deposit thickness to be deposited per a rotation cycle of the substrate passing through the discharging space and the non-discharging space to a 1000 .ANG. or less.
REFERENCES:
patent: 4582720 (1986-04-01), Yamazaki
patent: 4678644 (1987-07-01), Fukuta et al.
patent: 4729341 (1988-03-01), Fournier et al.
patent: 4760008 (1988-07-01), Yamazaki et al.
Arai Takayoshi
Hashizume Junichiro
Iida Shigehira
Saitoh Keishi
Takei Tetsuya
Canon Kabushiki Kaisha
Silverman Stanley
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