Microwave plasma CVD apparatus having substrate shielding member

Details Microwave plasma CVD apparatus having substrate shielding member Microwave plasma CVD apparatus having substrate shielding member

1990-02-07

1990-09-04

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118723, 118730, C23C 1650

Patent

active

049534980

ABSTRACT:
An improved MW-PCVD apparatus, characterized in that in the MW-CVD apparatus having a substrate onto which a deposited film to be formed and a space near the substrate for the decomposition of a raw material gas with the action of microwave energy, a shielding member is provided between said substrate and said space, which has an opening to allow part of the decomposed raw material gas species to be passed toward the substrate.

REFERENCES:
patent: 4729341 (1988-03-01), Fournier
patent: 4785763 (1988-11-01), Saitoh

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