4. Chemistry: electrical and wave energy
  5. Apparatus
  6. Coating, forming or etching by sputtering

Sergiy Yakovlevich Navala

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Gas injection apparatus for semiconductor processing system

Coating apparatus – Gas or vapor deposition
Reexamination Certificate

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High-density plasma processing apparatus

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

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Ionized physical vapor deposition apparatus using helical...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate

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Magnetron cathode and magnetron sputtering apparatus...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2424919

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