4. Semiconductor device manufacturing: process
  5. Formation of electrically isolated lateral semiconductive...
  6. Having substrate registration feature

Ryoichi Inanami

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Charged particle beam exposure method and method for...

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate

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Charged particle beam exposure method of character...

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate

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Charged particle beam exposure system using aperture mask in...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate

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Circuit pattern design method, circuit pattern design...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate

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Circuit pattern design method, exposure method,...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2207732

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