4. Chemistry: electrical and wave energy
  5. Apparatus
  6. Coating, forming or etching by sputtering

Rodney Lee Robison

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Ionized PVD with sequential deposition and etching

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Plasma processing system with locally-efficient inductive...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With radio frequency antenna or inductive coil gas...
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Plasma processing system with locally-efficient inductive...

Coating apparatus – Gas or vapor deposition – With treating means
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Plasma processing system with locally-efficient inductive...

Coating apparatus – Gas or vapor deposition – With treating means
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Transport system for wafer processing line

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Profile ID: LFUS-PAI-P-2123087

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