Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2007-09-24
2010-10-12
Hassanzadeh, Parviz (Department: 1716)
Coating apparatus
Gas or vapor deposition
With treating means
C156S345480, C315S111510, C216S068000
Reexamination Certificate
active
07810449
ABSTRACT:
A low inductance RF antenna is provided for producing a high-density plasma in a vacuum chamber for semiconductor wafer coating or etching. The antenna has a planar segmented configuration having high and low efficiency segments and produces a generally ring-shaped array of energy concentrations in the plasma around the periphery of the chamber. The antenna has closely spaced conductor segments through which current flows in one or more small cross-section conductors to produce high magnetic fields while alternating widely spaced conductor segments produce low strength magnetic fields.
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Brcka Jozef
Robison Rodney Lee
Dhingra Rakesh
Hassanzadeh Parviz
Tokyo Electron Limited
Wood Herron & Evans L.L.P.
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