4. Cleaning and liquid contact with solids
  5. Processes
  6. For metallic, siliceous, or calcareous basework, including...

Robert Joseph Purtell

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Method and structure for controlling the interface roughness...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Method and structure for controlling the interface roughness...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Removal of fluorine or chlorine residue by liquid CO.sub.2

Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...
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Residue removal by supercritical fluids

Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...
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Structure for controlling the interface roughness of cobalt...

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1124629

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