Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...
Patent
1996-10-16
1999-06-01
Knode, Marian C.
Cleaning and liquid contact with solids
Processes
For metallic, siliceous, or calcareous basework, including...
C03C 2300
Patent
active
059085100
ABSTRACT:
A method for the removal of residue from an etched precision surface such as a semiconductor sample is provided which comprises exposing said precision surface to a supercritical fluid or liquid CO.sub.2 under appropriate conditions that are sufficient to remove the residue from the precision surface. Cryogenic aerosol may be used in conjunction with either the supercritical fluid or liquid CO.sub.2.
REFERENCES:
patent: 3890176 (1975-06-01), Bolon
patent: 4944837 (1990-07-01), Nishikawa et al.
patent: 5013366 (1991-05-01), Jackson et al.
patent: 5068040 (1991-11-01), Jackson
patent: 5105556 (1992-04-01), Kurokawa et al.
patent: 5185058 (1993-02-01), Cathey, Jr.
patent: 5185296 (1993-02-01), Morita et al.
patent: 5213619 (1993-05-01), Jackson et al.
patent: 5215592 (1993-06-01), Jackson
patent: 5236602 (1993-08-01), Jackson
patent: 5267455 (1993-12-01), Dewees et al.
patent: 5294261 (1994-03-01), McDermott et al.
patent: 5304515 (1994-04-01), Morita et al.
patent: 5306350 (1994-04-01), Hoy et al.
patent: 5334332 (1994-08-01), Lee
patent: 5344493 (1994-09-01), Jackson
patent: 5368171 (1994-11-01), Jackson
patent: 5377705 (1995-01-01), Smith, Jr. et al.
patent: 5403621 (1995-04-01), Jackson et al.
patent: 5417768 (1995-05-01), Smith, Jr. et al.
patent: 5522938 (1996-06-01), O'Brien
Guan, Zhibin et al., "Fluorocarbon-Based Heterophase Polymeric Materials." Macromolecules, 1994, 27, pp. 5527-5532.
D.H. Ziger, et al., "Compressed Fluid Technology: Application to RIE-Developed Resists", AICaE Journal, 1987, 33, pp. 1585-1591.
Encylopedia of Chemical Technology, Third Edition, "Supercritical Fluids", John Wiley & Sons, 1984, pp. 872-891.
McCullough Kenneth John
Purtell Robert Joseph
Rothman Laura Beth
Wu Jin-Jwang
Brumback Brenda G.
International Business Machines - Corporation
Knode Marian C.
Trepp Robert M.
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