4. Coating processes
  5. Centrifugal force utilized

Rick R. Endo

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Method and apparatus for chemical mixing in a single wafer...

Coating processes – Centrifugal force utilized
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Method and apparatus for wafer cleaning

Cleaning and liquid contact with solids – Apparatus – With movable means to cause fluid motion
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Method and apparatus for wafer cleaning

Cleaning and liquid contact with solids – Apparatus – With movable means to cause fluid motion
Reexamination Certificate

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Method and apparatus for wafer cleaning

Cleaning and liquid contact with solids – Processes – With work or work parts movable during treatment
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Semiconductor substrate processing apparatus with a passive...

Material or article handling – Load support has linear vertical movement and additional... – Additional movement is rotational
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Profile ID: LFUS-PAI-P-3040484

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