Method and apparatus for wafer cleaning

Details Method and apparatus for wafer cleaning Method and apparatus for wafer cleaning

2001-06-25

2008-11-18

Markoff, Alexander (Department: 1792)

Cleaning and liquid contact with solids

Apparatus

With movable means to cause fluid motion

C134S157000, C134S001000, C134S001300, C134S902000

Reexamination Certificate

active

07451774

ABSTRACT:
An apparatus for wet processing individual wafers comprising; a means for holding the wafer; a means for providing acoustic energy to a non-device side of the wafer; and a means for flowing a fluid onto a device side of the wafer.

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