Method and apparatus for wafer cleaning

Details Method and apparatus for wafer cleaning Method and apparatus for wafer cleaning

2006-07-31

2010-10-26

Markoff, Alexander (Department: 1711)

Cleaning and liquid contact with solids

Processes

With work or work parts movable during treatment

C134S034000, C134S036000, C134S037000, C134S030000, C134S902000

Reexamination Certificate

active

07819985

ABSTRACT:
An apparatus for wet processing individual wafers comprising; a means for holding the wafer; a means for providing acoustic energy to a non-device side of the wafer; and a means for flowing a fluid onto a device side of the wafer.

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