4. Etching a substrate: processes
  5. Gas phase etching of substrate
  6. Application of energy to the gaseous etchant or to the...

Richard McGovern

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Contaminant reduction improvements for plasma etch chambers

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
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Contaminant reduction improvements for plasma etch chambers

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent

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Domed extension for process chamber electrode

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Quick release process kit

Coating apparatus – Gas or vapor deposition – Work support
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Profile ID: LFUS-PAI-P-411803

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