4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

Richard H. Matthiesen

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Gas injection system for semiconductor processing

Coating apparatus – Gas or vapor deposition
Patent

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Modular injector and exhaust assembly

Coating apparatus – Gas or vapor deposition
Reexamination Certificate

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Plasma enchanced chemical method

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Patent

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Plasma enhanced chemical processing reactor

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

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Plasma enhanced chemical processing reactor and method

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Profile ID: LFUS-PAI-P-607363

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