Coating apparatus – Gas or vapor deposition
Patent
1997-09-12
1998-12-22
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
20429807, 156345, C23C 1600, C23C 1400
Patent
active
058512942
ABSTRACT:
A system for injecting a gaseous substance into a semiconductor processing chamber. The injection system includes at least one plenum formed in a plenum body and a plurality of nozzles associated with each plenum for injecting gaseous substances from the plenums into the chamber. A conduit structure transports gaseous substances along an indirect path from the plenum to the nozzles. The nozzles are positioned and configured to provide a uniform distribution of gaseous substances across the wafer surface.
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Matthiesen Richard H.
Os Ron van
Selitser Simon
Young Lydia J.
Breneman R. Bruce
Lund Jeffrie R.
Watkins-Johnson Company
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