Gas injection system for semiconductor processing

Coating apparatus – Gas or vapor deposition

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Details

20429807, 156345, C23C 1600, C23C 1400

Patent

active

058512942

ABSTRACT:
A system for injecting a gaseous substance into a semiconductor processing chamber. The injection system includes at least one plenum formed in a plenum body and a plurality of nozzles associated with each plenum for injecting gaseous substances from the plenums into the chamber. A conduit structure transports gaseous substances along an indirect path from the plenum to the nozzles. The nozzles are positioned and configured to provide a uniform distribution of gaseous substances across the wafer surface.

REFERENCES:
patent: 4369031 (1983-01-01), Goldman
patent: 4446815 (1984-05-01), Kalbskopf et al.
patent: 4499853 (1985-02-01), Miller
patent: 4537795 (1985-08-01), Nath et al.
patent: 4590042 (1986-05-01), Drage
patent: 4795529 (1989-01-01), Kawasaki et al.
patent: 4817558 (1989-04-01), Itoh
patent: 4834020 (1989-05-01), Bartholomew et al.
patent: 4948458 (1990-08-01), Ogle
patent: 4986216 (1991-01-01), Ohmori et al.
patent: 4990229 (1991-02-01), Campbell et al.
patent: 4992665 (1991-02-01), Mohl
patent: 5105761 (1992-04-01), Charlet
patent: 5122251 (1992-06-01), Campbell et al.
patent: 5134965 (1992-08-01), Tokuda et al.
patent: 5221556 (1993-06-01), Hawkins et al.
patent: 5232508 (1993-08-01), Arena et al.
patent: 5280154 (1994-01-01), Cuomo et al.
patent: 5290993 (1994-03-01), Kaji et al.
patent: 5304247 (1994-04-01), Kondo
patent: 5328722 (1994-07-01), Ghanayem et al.
patent: 5336326 (1994-08-01), Karner et al.
patent: 5368646 (1994-11-01), Yasuda et al.
patent: 5368710 (1994-11-01), Chen et al.
patent: 5391232 (1995-02-01), Kanai et al.
patent: 5468298 (1995-11-01), Lei et al.
patent: 5551982 (1996-09-01), Anderson
patent: 5551985 (1996-09-01), Brors
patent: 5614055 (1997-03-01), Fairbairn et al.

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