4. Semiconductor device manufacturing: process
  5. Making field effect device having pair of active regions...
  6. Having insulated gate

Raymond T. Lee

Inventor

Rate now
  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Inventor

active

Aluminum disposable spacer to reduce mask count in CMOS...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Amorphous silicon disposable spacer to reduce mask count in...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Forming local interconnects in integrated circuits

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Forming minimal size spaces in integrated circuit conductive lin

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Polycrystalline semiconductor
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Forming minimal size spaces in integrated circuit conductive...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Raymond T. Lee does not yet have a rating. At this time, there are no reviews or comments for this inventor.

If you have personal experience with Raymond T. Lee, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Raymond T. Lee will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-P-583758

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.

Canada

 Charities
 Companies
 MP Candidates
 Patents
 Employee Salary Disclosure

World

 Places of the World
 Scientific Papers

United States

 Banks
 Companies
 Counties
 Patents
 Employee Salary Disclosure