4. Metal working
  5. Method of mechanical manufacture
  6. Electrical device making

Pushkar Ranade

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CMOS device with dual-epi channels and self-aligned contacts

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate

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Deposition of hafnium oxide and/or zirconium oxide and...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Dual work function CMOS gate technology based on metal...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Dual work function CMOS gate technology based on metal...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate

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Method of forming CMOS transistors with dual-metal silicide...

Metal working – Method of mechanical manufacture – Electrical device making
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Profile ID: LFUS-PAI-P-2272000

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