4. Coating apparatus
  5. Gas or vapor deposition
  6. Work support

Ping Xin

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High-speed rotational vapor deposition apparatus and high-speed

Coating apparatus – Gas or vapor deposition – Work support
Patent

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Manufacturing method of a silicon wafer having a controlled BMD

Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth with a subsequent step acting on the...
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Vapor deposition apparatus and method for forming thin film

Coating apparatus – Gas or vapor deposition – Work support
Patent

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Vapor deposition apparatus and vapor deposition method

Coating apparatus – Gas or vapor deposition – Work support
Patent

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Profile ID: LFUS-PAI-P-692662

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