4. Coating apparatus
  5. Program, cyclic, or time control
  6. Having prerecorded program medium

Paul Gee

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Chemical vapor deposition of high quality flow-like silicon...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate

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Method and apparatus for forming a dielectric film using...

Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized
Reexamination Certificate

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Method of forming phosphosilicate glass having a high wet-etch r

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Patent

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Methods and apparatus for forming ultra-shallow doped regions us

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Fusing dopant with substrate
Patent

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Methods and apparatus for forming ultra-shallow doped regions us

Coating apparatus – Program – cyclic – or time control – Having prerecorded program medium
Patent

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Profile ID: LFUS-PAI-P-1269398

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