Coating apparatus – Program – cyclic – or time control – Having prerecorded program medium
Patent
1999-09-30
2000-08-08
Bueker, Richard
Coating apparatus
Program, cyclic, or time control
Having prerecorded program medium
118725, C23C 1600
Patent
active
060996471
ABSTRACT:
The present invention provides systems, methods and apparatus for high temperature (at least about 500-800.degree. C.) processing of semiconductor wafers. The systems, methods and apparatus of the present invention allow multiple process steps to be performed in situ in the same chamber to reduce total processing time and to ensure high quality processing for high aspect ratio devices. Performing multiple process steps in the same chamber also increases the control of the process parameters and reduces device damage. In particular, the present invention can provide high temperature deposition, heating and efficient cleaning for forming dielectric films having thickness uniformity, good gap fill capability, high density, low moisture, and other desired characteristics.
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Gee Paul
Nguyen Bang
Xia Li-Qun
Yieh Ellie
Applied Materials Inc.
Bueker Richard
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