Etching a substrate: processes
Gas phase etching of substrate
Application of energy to the gaseous etchant or to the...
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Deposition reactor having vaporizing, mixing and cleaning...
Method of fabricating a high dielectric constant transistor...
Methods and apparatus for incorporating nitrogen in oxide films
Methods and apparatus for incorporating nitrogen in oxide films
Post deposition treatment of dielectric films for interface...
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Profile ID: LFUS-PAI-P-2078956