- LandOfFree
- Inventors
- Semiconductor device manufacturing: process
- Formation of electrically isolated lateral semiconductive...
- Grooved and refilled with deposited dielectric material
Details
Nobuhide Yamada
Nobuhide
Yamada
Semiconductor device manufacturing: process
Formation of electrically isolated lateral semiconductive...
Grooved and refilled with deposited dielectric material
Inventor
active
Affiliated with
Composition for film formation, insulating film,...
Active solid-state devices (e.g. – transistors – solid-state diode – With means to control surface effects – Insulating coating
Reexamination Certificate
[ 0.00 ] – not rated yet
Film forming method, film forming apparatus, pattern forming...
Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate
[ 0.00 ] – not rated yet
Film forming method, film forming apparatus, pattern forming...
Coating processes – Measuring – testing – or indicating
Reexamination Certificate
[ 0.00 ] – not rated yet
Film forming method, film forming apparatus, pattern forming...
Coating processes – Measuring – testing – or indicating
Reexamination Certificate
[ 0.00 ] – not rated yet
Film forming method, film forming apparatus, pattern forming...
Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
[ 0.00 ] – not rated yet
Also associated with
No associations
LandOfFree
Say what you really think
Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.
Rating
Nobuhide Yamada does not yet have a rating.
At this time, there are no reviews or comments for this inventor.
If you have personal experience with Nobuhide Yamada, we encourage you to share that experience with our LandOfFree.com community.
Your opinion is very important and Nobuhide Yamada will most certainly appreciate the feedback.
Rate now
Profile ID: LFUS-PAI-P-2200073
All data on this website is collected from public sources.
Our data reflects the most accurate information available at the time of publication.