4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

Nicholas Eib

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Apparatus for rapid thermal processing of a wafer

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Method of forming a layer and semiconductor substrate

Semiconductor device manufacturing: process – Radiation or energy treatment modifying properties of... – Ionized irradiation
Patent

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Process for etching a controllable thickness of oxide on an...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

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PROCESS FOR FORMING THIN GATE OXIDE WITH ENHANCED...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
Reexamination Certificate

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Process window compliant corrections of design layout

Data processing: structural design – modeling – simulation – and em – Simulating electronic device or electrical system – Circuit simulation
Reexamination Certificate

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Profile ID: LFUS-PAI-P-402037

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