4. Adhesive bonding and miscellaneous chemical manufacture
  5. Differential fluid etching apparatus
  6. Having glow discharge electrode gas energizing means

Mukund Srinivasan

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Chamber configuration for confining a plasma

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – Having glow discharge electrode gas energizing means
Reexamination Certificate

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Chamber configuration for confining a plasma

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – Having glow discharge electrode gas energizing means
Reexamination Certificate

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High aspect ratio etch using modulation of RF powers of...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Methods of reducing photoresist distortion while etching in...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
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Multiple frequency plasma processor method and apparatus

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
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Profile ID: LFUS-PAI-P-2324026

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