4. Semiconductor device manufacturing: process
  5. Chemical etching
  6. Altering etchability of substrate region by compositional or...

Ming Lun Yu

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Beam exposure correction system and method

Radiant energy – With charged particle beam deflection or focussing – Magnetic lens
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Method and instrument for chemical defect characterization...

Radiant energy – Inspection of solids or liquids by charged particles
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Structural modification using electron beam activated...

Etching a substrate: processes – Gas phase etching of substrate
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Use of ion implantation in chemical etching

Semiconductor device manufacturing: process – Chemical etching – Altering etchability of substrate region by compositional or...
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2242171

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