Etching a substrate: processes – Gas phase etching of substrate
Reexamination Certificate
2007-01-12
2011-11-08
Norton, Nadine G (Department: 1713)
Etching a substrate: processes
Gas phase etching of substrate
C438S706000
Reexamination Certificate
active
08052885
ABSTRACT:
Structural modification using electron beam activated chemical etch (EBACE) is disclosed. A target or portion thereof may be exposed to a gas composition of a type that etches the target when the gas composition and/or target are exposed to an electron beam. By directing an electron beam toward the target in the vicinity of the gas composition, an interaction between the electron beam and the gas composition etches a portion of the target exposed to both the gas composition and the electron beam. Structural modifications of the target may be conducted by means of etching due to interaction between the electron beam and gas composition.
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Garcia Rudy F.
Huang Chris
Krzeczowski Kenneth
Lent Matthew
Lopatin Sergey
Duclair Stephanie
Isenberg Joshua D.
JDI Patent
KLA-Tencor Corporation
Norton Nadine G
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