Beam exposure correction system and method

Details Beam exposure correction system and method Beam exposure correction system and method

2005-09-28

2008-08-26

Berman, Jack I. (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

C250S397000, C250S398000, C250S3960ML, C250S492220

Reexamination Certificate

active

07417233

ABSTRACT:
A system and method of determining shape and position corrections of a beam such as a particle or other beam used in a system such as a particle beam lithography. The method of providing corrected deflector voltages may include determining a voltage step value by subtracting a previous deflector voltage value with a current deflector voltage value; determining a plurality of correction values using the voltage step value and an exposure time for the current deflector voltage value; selecting a current voltage correction value from the plurality of correction values using the current deflector voltage value; and calculating a corrected deflector voltage value by adding the current voltage correction value to the current deflector voltage value.

REFERENCES:
patent: 5831273 (1998-11-01), Someda et al.
patent: 5847959 (1998-12-01), Veneklasen et al.
patent: 6420717 (2002-07-01), Babin et al.
patent: 6521901 (2003-02-01), Shamoun et al.
patent: 6878950 (2005-04-01), Shamoun et al.
patent: 2002/0147507 (2002-10-01), Stanton
patent: 2003/0098424 (2003-05-01), Shamoun et al.

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