4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

Masanori Ohmura

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Apparatus for forming thin films

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Apparatus for manufacturing silicon single crystals

Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Including specific material of construction
Patent

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Apparatus for manufacturing single silicon crystal

Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Including specific material of construction
Patent

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Film forming apparatus

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Laser-welded steel pipe

Metal treatment – Stock – Ferrous
Patent

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Profile ID: LFUS-PAI-P-312815

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