4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

Masamichi Sakaguchi

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LSI device etching method and apparatus thereof

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Method for manufacturing semiconductor device

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Plasma etching method

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Plasma processing method

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
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Plasma processing method for working the surface of...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Profile ID: LFUS-PAI-P-2327143

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