Plasma processing method

Details Plasma processing method Plasma processing method

2011-03-22

2011-03-22

Komakov, Michael (Department: 1712)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C134S001000, C134S026000

Reexamination Certificate

active

07909933

ABSTRACT:
The invention provides a plasma processing method capable of reducing particle caused by flinging up of particles by airflow due to the pressure fluctuation in the processing chamber during the time the sample is carried into the processing chamber, subjected to plasma processing and carried out of the processing chamber. The invention provides a plasma processing method using a plasma processing apparatus comprising multiple plasma processing chambers for processing samples, a transfer chamber connected to the processing chambers for transferring samples, and a supply system for supplying gas which is the same gas as a transferring gas supplied to the transfer chamber to both the processing chambers and transfer chamber or to only the processing chambers, wherein the process comprises (b) a step of transferring the sample into the processing chamber with the transferring gas supplied to the processing chamber; (c) thereafter, generating plasma from the transferring gas supplied to the processing chamber while maintaining the supply of transferring gas to the processing chamber; (d) a step of switching the gas supplied to the processing chamber from transferring gas to processing gas while maintaining plasma by supplying processing gas continuously to the processing chamber; and (e) a step of subjecting the sample to plasma processing.

REFERENCES:
patent: 4115184 (1978-09-01), Poulsen
patent: 5968279 (1999-10-01), MacLeish et al.
patent: 6136211 (2000-10-01), Qian et al.
patent: 6814087 (2004-11-01), Chandran et al.
patent: 2007/0042132 (2007-02-01), Seo et al.
patent: 2004-281832 (2004-10-01), None
patent: 2004281832 (2004-10-01), None
patent: 2006-162612 (2006-06-01), None
English translation of JP 2004-281832.

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