4. Coating apparatus
  5. Gas or vapor deposition

Masahito Sugiura

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Etching method

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

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Fabrication process of a semiconductor device

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Film forming apparatus and method, and film modifying apparatus

Coating apparatus – Gas or vapor deposition – Multizone chamber
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Film forming method by radiating a plasma on a surface of a...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Film forming method, and film modifying method

Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
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Profile ID: LFUS-PAI-P-354237

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