Film forming method, and film modifying method

Details Film forming method, and film modifying method Film forming method, and film modifying method

2006-05-02

2006-05-02

Padgett, Marianne (Department: 1762)

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

C427S561000, C427S564000, C427S584000, C427S255310, C427S255360, C427S255350

Reexamination Certificate

active

07037560

ABSTRACT:
A film forming and film modifying method utilizing a film forming apparatus which has an alcohol supply unit to form a metal oxide film on a semiconductor wafer in a vacuum atmosphere in which a vaporized metal oxide film material and a vaporized alcohol exist. The film modifying method irradiates a UV ray on ozone to generate active oxygen atoms, thus modifying the metal oxide film by exposing the metal oxide film to the active oxygen atoms in a vacuum atmosphere.

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