Film forming apparatus and method, and film modifying apparatus

Details Film forming apparatus and method, and film modifying apparatus Film forming apparatus and method, and film modifying apparatus

1997-07-08

2000-11-07

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118715, 118722, 118723ME, 118723IR, 118725, C23C 1600

Patent

active

061430811

ABSTRACT:
A film forming/modifying system includes a film forming apparatus which has an alcohol supply unit and forms a metal oxide film on a semiconductor wafer in a vacuum atmosphere in which a vaporized metal oxide film material and a vaporized alcohol exist, a film modifying apparatus which has a UV irradiation unit for irradiating a UV ray on ozone to generate active oxygen atoms, and modifies the metal oxide film by exposing the metal oxide film to the active oxygen atoms in a vacuum atmosphere, and a common transfer chamber commonly coupled to the film forming apparatus and the film modifying apparatus to transfer the target process object between the film forming apparatus and the film modifying apparatus while maintaining the vacuum state.

REFERENCES:
patent: 4540466 (1985-09-01), Nishizawa
patent: 4597986 (1986-07-01), Scrapple
patent: 4687544 (1987-08-01), Bersen
patent: 4716852 (1988-01-01), Tsujii

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