4. Etching a substrate: processes
  5. Gas phase etching of substrate
  6. Application of energy to the gaseous etchant or to the...

Masahiro Ogasawara

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Apparatus and method for generating plasma of uniform flux densi

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent

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Dry etching method

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Patent

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Dry etching method

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent

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Etching process

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Magnetron plasma processing apparatus

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
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Profile ID: LFUS-PAI-P-53001

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