Apparatus and method for generating plasma of uniform flux densi

Details Apparatus and method for generating plasma of uniform flux densi Apparatus and method for generating plasma of uniform flux densi

1994-10-20

1995-09-12

Mis, David

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511141, H01J 3700

Patent

active

054499771

ABSTRACT:
Under a reduced pressure, an RF electric field is applied at a right angle to a main face of an article-to-be-treated such as a semiconductor, wafer placed on a cathode in treatment chamber. At the same time, a magnetic field is applied thereto by a magnetic field applying device to generate a plasma by a magnetron discharge. The magnetic field is formed in such a fashion that adjacent magnetic lines of flux are not in parallel with one another on the main face of the article-to-be-treated. Charged particles in the plasma drift in a diverging direction with Lorenz force so as to prevent electrification of the article-to-be-treated.

REFERENCES:
patent: 4950956 (1990-08-01), Asamaki et al.
patent: 5032202 (1991-07-01), Tsai et al.
patent: 5079481 (1992-01-01), Moslehi
patent: 5081398 (1992-01-01), Asmussen et al.
Chen, "Introduction To Plasma Physics And Controlled Fusion", 2nd Ed., vol. 1, Chap. 2, 1984, Plenum Press, New York, pp. 19-51.

Affiliated with

Also associated with

Rating

Apparatus and method for generating plasma of uniform flux densi does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for generating plasma of uniform flux densi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for generating plasma of uniform flux densi will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-407615