Dry etching method

Details Dry etching method Dry etching method

1992-12-10

1994-10-18

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156657, 156345, H01L 2100

Patent

active

053565150

ABSTRACT:
A dry etching method which includes supplying a workpiece having an oxide portion or a nitride portion into a processing vessel, keeping said workpiece at temperatures not higher than 0.degree. C. within said processing vessel, supplying an etching gas including a first gas containing a halogen element and a second gas containing carbon having an oxidation number of less than 4 and oxygen to a region in the vicinity of the workpiece while keeping the temperature the workpiece at a level not higher than 0.degree. C., and forming a plasma of said etching gas for etching the oxide portion or the nitride portion of the workpiece with said plasma.

REFERENCES:
patent: 4582581 (1986-04-01), Flanigan et al.
patent: 5147500 (1992-09-01), Tachi et al.

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