4. Semiconductor device manufacturing: process
  5. Making field effect device having pair of active regions...
  6. Having insulated gate

Martin D. Giles

Inventor

Rate now
  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Inventor

active

Complementary metal oxide semiconductor integrated circuit...

Active solid-state devices (e.g. – transistors – solid-state diode – Including semiconductor material other than silicon or... – Group iii-v compound
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Gate-induced strain for MOS performance improvement

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Gate-induced strain for MOS performance improvement

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Method and structure to decrease area capacitance within a...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Method to form a structure to decrease area capacitance...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Martin D. Giles does not yet have a rating. At this time, there are no reviews or comments for this inventor.

If you have personal experience with Martin D. Giles, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Martin D. Giles will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-P-2840316

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.

Canada

 Charities
 Companies
 MP Candidates
 Patents
 Employee Salary Disclosure

World

 Places of the World
 Scientific Papers

United States

 Banks
 Companies
 Counties
 Patents
 Employee Salary Disclosure