4. Semiconductor device manufacturing: process
  5. Formation of electrically isolated lateral semiconductive...
  6. Grooved and refilled with deposited dielectric material

Kuo-Tai Huang

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Conformity of ultra-thin nitride deposition for DRAM capacitor

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate

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Fabrication method of a tantalum pentoxide dielectric layer for

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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High-K dielectric metal gate device structure

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate

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High-k dielectric metal gate device structure and method for...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate

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Hybrid process for forming metal gates

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate

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Profile ID: LFUS-PAI-P-197938

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