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Kunitaka Ozawa

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Alignment apparatus and SOR X-ray exposure apparatus having same

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Alignment apparatus and SOR x-ray exposure apparatus having same

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Alignment method for printing a pattern of an original onto diff

Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems
Patent

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Alignment system

Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Patent

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Alignment system

Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Patent

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Profile ID: LFUS-PAI-P-33616

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