Alignment method for printing a pattern of an original onto diff

Details Alignment method for printing a pattern of an original onto diff Alignment method for printing a pattern of an original onto diff

1990-09-27

1992-08-25

Nelms, David C.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

356401, G01N 2186

Patent

active

051421569

ABSTRACT:
An alignment method for use in an exposure apparatus for printing a pattern of an original onto different surface areas of a substrate, the alignment method comprising the steps of: providing alignment marks around the pattern of the original and placing the original on an original supporting stage; providing a reference mark on an X-Y stage for supporting the substrate and being movable in X and Y directions, and moving the X-Y stage so as to place the reference mark at those positions, in sequence, which correspond to the alignment marks of the original, respectively, and which are preset in respect to a stage coordinate system; detecting, in sequence, positional errors of the alignment marks of the original with respect to the corresponding set positions, respectively, by using the reference mark and through the movement of the X-Y stage, wherein the positional errors are detected by use of positional error detectors which are provided to be associated with the alignment marks of the original, respectively; calculating a rotational error of the original with respect to the stage coordinate system, in .theta. direction, by using the positional errors; and rotationally moving the original supporting table in the .theta. direction so as to correct the rotational error.

REFERENCES:
patent: 4662753 (1987-05-01), Yabu
patent: 4677301 (1987-06-01), Tanimoto et al.
patent: 4766309 (1988-08-01), Kudo
patent: 4780615 (1988-10-01), Suzuki

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