X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1995-05-15
1996-06-04
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Lithography
378160, G21K 500
Patent
active
055241310
ABSTRACT:
A semiconductor device manufacturing SOR X-ray exposure apparatus wherein, after a mask and a semiconductor wafer are aligned, and SOR X-ray is used to transfer a semiconductor device pattern on the mask onto a resist on the semiconductor wafer. The apparatus includes a mirror unit and an exposure unit for exposing the wafer through the mask to the X-ray from the mirror unit. The mirror unit includes an X-ray mirror for diverging the X-ray in a desired direction, a first chamber for providing a desired vacuum ambience around the X-ray mirror and a first supporting device for supplying the X-ray mirror. The exposure unit includes a shutter for controlling the exposure, a mask stage for holding the mask, a wafer stage for holding the wafer, a second chamber for providing a desired He ambience around the mask stage and the wafer stage, a frame structure for mounting the mask stage and the wafer stage and a second supporting device for supporting the frame structure. By this, a more highly integrated semiconductor device can be produced.
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Abe Naoto
Amemiya Mitsuaki
Ebinuma Ryuichi
Higomura Makoto
Kariya Takao
Canon Kabushiki Kaisha
Church Craig E.
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