X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1995-06-05
1998-10-13
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Lithography
378210, G21K 500
Patent
active
058223894
ABSTRACT:
A synchrotron exposure includes a synchrotron radiation source for generating a synchrotron radiation beam, and exposure unit having a mask stage for holding a mask and a wafer stage for holding a waver, a beam port for directing the radiation beam to the exposure unit, a mirror unit having a mirror for reflecting the radiation beam, a pre-alignment system for aligning the wafer relative to the wafer stage, a fine-alignment system for aligning the wafer held by the wafer stage relative to the mask held by the mask stage, a mask storage apparatus for storing the mask, a wafer storage apparatus for storing the wafer, a mask conveying apparatus for conveying the mask between the mask storage apparatus and the mask stage and a wafer conveying apparatus for conveying a wafer between the wafer storage apparatus and the wafer stage.
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Patent Abstracts of Japan, Kokai No. 60-7722, vol. 9, No. 118, May /1985.
Abe Naoto
Amemiya Mitsuaki
Ebinuma Ryuichi
Higomura Makoto
Kariya Takao
Canon Kabushiki Kaisha
Church Craig E.
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