Kevin Michael Welsh

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Antireflective coating for microlithography

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From phenol – phenol ether – or inorganic phenolate
Reexamination Certificate

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Making of microlithographic structures with an underlayer film c

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
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Method for patterning a photoresist material wherein an anti-ref

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent

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Microlithographic structure with an underlayer film comprising a

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent

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Microlithographic structure with an underlayer film containing a

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent

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Profile ID: LFUS-PAI-P-31561

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