Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1994-12-13
1997-09-02
Lesmes, George F.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430156, 430167, 430512, 430522, G03C 1492, G03C 152, G03C 1815, G03C 106
Patent
active
056630360
ABSTRACT:
Microlithographic methods for the use of improved underlayers for chemically amplified deep UV photoresist compositions and structures produced thereby are disclosed. The compositions comprise, in admixture, a polymeric binder, and an azide which is thermolyzed during microlithographic processing to form an amine. Films formed from the underlayer compositions of the present invention, when applied immediately under and proximate to a chemically amplified photoresist film reduce the resist structure sidewall foot or undercut caused by an adverse contact reaction.
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Conley Willard Earl
Fahey James Thomas
Moreau Wayne Martin
Sooriyakumaran Ratnam
Welsh Kevin Michael
Codd Bernard P.
Crockatt Dale M.
International Business Machines - Corporation
Lesmes George F.
Soucar Steven J.
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