Making of microlithographic structures with an underlayer film c

Details Making of microlithographic structures with an underlayer film c Making of microlithographic structures with an underlayer film c

1996-11-26

1998-08-18

Codd, Bernard P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430156, 430167, 430296, 430326, 430327, 430330, 430967, G03C 516

Patent

active

057957010

ABSTRACT:
Microlithographic methods for the use of improved underlayers for chemically amplified deep UV photoresist compositions and structures produced thereby are disclosed. The compositions comprise, in admixture, a polymeric binder, and an azide which is thermolyzed during microlithographic processing to form an amine. Films formed from the underlayer compositions of the present invention, when applied immediately under and proximate to a chemically amplified photoresist film reduce the resist structure sidewall foot or undercut caused by an adverse contact reaction.

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