Microlithographic structure with an underlayer film containing a

Details Microlithographic structure with an underlayer film containing a Microlithographic structure with an underlayer film containing a

1997-02-04

1998-07-21

Codd, Bernard P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430156, 430167, 430512, 430522, G03C 1492, G03C 152, G03C 1815, G03C 106

Patent

active

057833613

ABSTRACT:
Microlithographic methods for the use of improved underlayers for chemically amplified deep UV photoresist compositions and structures produced thereby are disclosed. The compositions comprise, in admixture, a polymeric binder, and an azide which is thermolyzed during microlithographic processing to form an amine. Films formed from the underlayer compositions of the present invention, when applied immediately under and proximate to a chemically amplified photoresist film reduce the resist structure sidewall foot or undercut caused by an adverse contact reaction.

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