Drying and gas or vapor contact with solids
Process
Gas or vapor contact with treated material
Inventor
active
In situ plasma process to remove fluorine residues from the...
Method for plasma etching or cleaning with diluted NF.sub.3
Moisture removal and passivation of surfaces
Plasma etch with trifluoroacetic acid and derivatives
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Profile ID: LFUS-PAI-P-409579