Moisture removal and passivation of surfaces

Details Moisture removal and passivation of surfaces Moisture removal and passivation of surfaces

1994-10-25

1996-01-02

Kwon, John T.

Drying and gas or vapor contact with solids

Process

Gas or vapor contact with treated material

34517, F26B 300

Patent

active

054797276

ABSTRACT:
The present invention is a process of removal of moisture from surfaces, such as metal conduit for transmission of high purity gases in electronic component fabrication facilities, and the passivation of such metal surfaces to retard the readsorption of moisture, wherein the moisture removal and passivation is enhanced using an agent of the formula: R.sub.a SiX.sub.b Y.sub.c Z.sub.d where a =1-3; b, c, and d are individually 0-3 and a+b+c+d=4; R is one or more organic groups; and at least one of X, Y or Z have a bond to silicon that is readily hydrolyzable. The moisture removal and passivation is conducted at less than 65.degree. C. and at least ambient pressure.

REFERENCES:
patent: 3307271 (1967-03-01), Simpson
patent: 3608000 (1971-09-01), Anderson
patent: 3716384 (1973-02-01), Anderson
patent: 5255445 (1993-10-01), Li et al.
Tatenuma, K., et al. "Quick Acquisition of Clean Ultrahigh Vacuum by Chemical Process Technology." J. Vac. Sci. Technol. A 11(4) Jul./Aug. 1993:1719-1724.

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