4. Computer-aided design and analysis of circuits and semiconductor
  5. Design of semiconductor mask or reticle
  6. Analysis and verification

James Walter Blatchford

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EDA methodology for extending ghost feature beyond notched...

Radiation imagery chemistry: process – composition – or product th – Plural exposure steps
Reexamination Certificate

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Gate critical dimension variation by use of ghost features

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate

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Method for layout of random via arrays in the presence of...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Layout generation
Reexamination Certificate

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Method for performing place-and-route of contacts and vias...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate

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System and method for making photomasks

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2157972

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